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Dry surface blast using low pressure oxygen plasma.
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Use of optical profiling equipment to measure thin film thicknesses and refractive index.
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Nano and micro-manufacture using the photolithographic mask alignment technique for photoresists that are sensitive to ultraviolet.
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Thin film manufacture using the spin-coating technique. The equipment available offers the possibility of depositing controlled thickness (nanometres and micrometres) thin films of materials in…
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