Site card
PRONGP901CP ICP-RIE plasma generating equipment
Where:
University Optoelectronics and Microtechnology Systems Institute
Ubicación:
09C.00.015.0 SALA RIE ISOM
Typology:
Infraestructura Científica y Técnica Singular (ICTS)
Manager: Manuel Abuin
Email:
PRONGP901CP ICP-RIE plasma generating equipment
Its area of activity can be categorised as selectively attacking layers of different materials.
It allows layers of materials to be removed in a controlled manner by means of reactive plasma ions.
It is used to carry out different dry reactive etching processes in a controlled manner. It makes it possible to carry out etching with vertical walls.
Microelectronics, nanoelectronics
